EFFECT OF RADIATION EXPOSURE ON PbS PHOTOSENSITIVE FILMS

Abstract

This article investigates the critical role of surface adsorption of acceptor or donor atoms in the formation of photosensitive thin films, with a focus on sensitized PbS films. While the influence of surface interactions on film properties has been well established, the presence of multiple effective boundaries in multiphase systems like PbS complicates the understanding of dark resistance (Rto) and photoconductivity. The study explores how thermal and radiation effects influence the kinetic parameters of these films, particularly addressing the contribution of oxygen to the sensitization process. Through this examination, the article provides deeper insights into the mechanisms driving the photosensitivity of PbS films, paving the way for improved understanding and application of these materials in optoelectronic devices.